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Photoelectron experiments on semiconductor heterostructures using synchrotron radiation Colbow, Kevin Michael
Abstract
Photoelectron spectroscopy using synchrotron radiation has been used to study a variety of semiconductor heterostructures. The electronic properties and composition of the interfaces between selected wide band gap materials and GaAs have been explored. Three types of wide band gap materials were considered namely chalcogen compounds, alkaline-earth fluorides, and rare-earth trifluorides. Prior to the growth of thin surface layers, the semiconductor substrates had to be atomically clean. The final step of the cleaning process normally involves desorbing the surface oxide layer. The effect of surface roughening was observed for the first time as a result of optically monitoring the oxide desorption in GaAs. High resolution photoemission spectroscopy of clean GaAs (100) surfaces treated with H2S revealed that these surfaces are completely terminated by a GaSx species which is stable in air or water. The H2S treated surfaces are better defined in terms of the interfacial chemical bonding than the recently proposed chemical treatments involving Na2S or (NH4)2S [More abstract follow]
Item Metadata
Title |
Photoelectron experiments on semiconductor heterostructures using synchrotron radiation
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Creator | |
Publisher |
University of British Columbia
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Date Issued |
1992
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Description |
Photoelectron spectroscopy using synchrotron radiation has been used to
study a variety of semiconductor heterostructures. The electronic properties and
composition of the interfaces between selected wide band gap materials and GaAs
have been explored. Three types of wide band gap materials were considered
namely chalcogen compounds, alkaline-earth fluorides, and rare-earth trifluorides.
Prior to the growth of thin surface layers, the semiconductor substrates had
to be atomically clean. The final step of the cleaning process normally involves
desorbing the surface oxide layer. The effect of surface roughening was observed
for the first time as a result of optically monitoring the oxide desorption in GaAs.
High resolution photoemission spectroscopy of clean GaAs (100) surfaces
treated with H2S revealed that these surfaces are completely terminated by a GaSx
species which is stable in air or water. The H2S treated surfaces are better defined
in terms of the interfacial chemical bonding than the recently proposed chemical
treatments involving Na2S or (NH4)2S
[More abstract follow]
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Extent |
2656064 bytes
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Genre | |
Type | |
File Format |
application/pdf
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Language |
eng
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Date Available |
2008-12-19
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Provider |
Vancouver : University of British Columbia Library
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Rights |
For non-commercial purposes only, such as research, private study and education. Additional conditions apply, see Terms of Use https://open.library.ubc.ca/terms_of_use.
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DOI |
10.14288/1.0085639
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URI | |
Degree | |
Program | |
Affiliation | |
Degree Grantor |
University of British Columbia
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Graduation Date |
1992-05
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Campus | |
Scholarly Level |
Graduate
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Aggregated Source Repository |
DSpace
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Item Media
Item Citations and Data
Rights
For non-commercial purposes only, such as research, private study and education. Additional conditions apply, see Terms of Use https://open.library.ubc.ca/terms_of_use.