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A radiation model of a Rapid Thermal Processing system Wacher, Abigail

Abstract

In this thesis we study the radiative heat transfer that takes place in the axially symmetric Vortek rapid thermal processing chamber. A radiation model is derived using the theory of Shape Factors which we use to predict how chamber geometry and materials affect temperature uniformity on the processed silicon wafer. Using a series of numerical experiments on an axially symmetric domain we are able to predict the radiative effects on the temperature uniformity of the processed wafer in terms of the size of the showerhead and guard ring, the reflectivity of the showerhead and the chamber height.

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