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Development of a technology framework for rapid polymer MEMS fabrication process based on SU-8 photoresist

University of British Columbia

This Ph.D. thesis introduces a technology framework to fabricate MEMS devices using SU-8 photoresist. The lithography process of SU-8 photoresist can directly create polymeric microstructures with good chemical and mechanical stability. This characteristic makes the SU-8 photoresist suitable as the structural material for polymeric MEMS devices. However, there are several issues in the current primary fabrication methods for SU-8 MEMS devices. Existing microfabrication methods suffer from processing complexity, uncertainties, and relatively high cost. This thesis focuses on addressing these issues. Novel methodologies are used to improve the fabrication process of SU-8 out-of-plane and in-plane MEMS devices. Sacrificial-layer-free fabrication of SU-8 out-of-plane MEMS devices has been implemented using an advanced lithography principle, pixel-level dose modulation, resulting in a three-step fabrication method. A novel processing strategy is proposed to implement optimum processing for SU-8 in-plane MEMS fabrication, resulting in a four-step fabrication method. Experimental case studies with test structures have been carried out to evaluate the newly-developed methods. The main features (process predictability, reproducibility, robustness, etc.) of the newly-developed microfabrication processes have been validated after calibration. The research work of this thesis presents two new technological paths to fabricate SU-8 MEMS devices. The technology framework proposed in this thesis validates the feasibility of the two new paths’ methodologies, building up the basis towards a customizable, low-cost, and rapid platform to fabricate polymeric MEMS devices. Meanwhile, the technology framework itself can be used for the rapid fabrication of SU-8 MEMS prototypes, accelerating the application and validation of novel principles and designs for polymeric MEMS devices.

Text

2021-04-14

Attribution-NonCommercial-NoDerivatives 4.0 International

http://hdl.handle.net/2429/77779

Electrical and Computer Engineering

University of British Columbia

UBCV

http://creativecommons.org/licenses/by-nc-nd/4.0/